SCOPUS 정보 검색 플랫폼

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 8, 2000, Pages 4945-4951

Influence of RF power supply on electron-cyclotron-resonance plasma with mirror confinement for SrTiO3 thin film formation

(2) Baba, So a Miyake, Shoji a

a OSAKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; LIGHT EMISSION; MIRRORS; PLASMA APPLICATIONS; PLASMA CONFINEMENT; PLASMA DENSITY; SPUTTER DEPOSITION; STRONTIUM COMPOUNDS; THIN FILMS;

LOW PRESSURE ELECTRON-CYCLOTRON-RESONANCE PLASMA SPUTTERING SYSTEMS; MIRROR CONFINEMENT; SPUTTERED PARTICLE FLUX;

PEROVSKITE;

EID: 0034245161 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.39.4945 Document Type: Article

Times cited : (9)

References (15)

1
- 0000404356
- B. Panda, A. Dhar, G. D. Nigam, D. Bhattacharya and S. K. Ray: J. Appl. Phys. 83 (1998) 1114.
- (1998) J. Appl. Phys. , vol.83 , pp. 1114
- Panda, B.¹ Dhar, A.² Nigam, G.D.³ Bhattacharya, D.⁴ Ray, S.K.⁵

2
- 0010695283
- S. Matsuhara, S. Miura, Y. Miyasaka and N. Shohata: J. Appl. Phys. 66 (1989) 5826.
- (1989) J. Appl. Phys. , vol.66 , pp. 5826
- Matsuhara, S.¹ Miura, S.² Miyasaka, Y.³ Shohata, N.⁴

3
- 0000314667
- J. R. Belsick and S. B. Krupanidhi: J. Appl. Phys. 74 (1993) 6851.
- (1993) J. Appl. Phys. , vol.74 , pp. 6851
- Belsick, J.R.¹ Krupanidhi, S.B.²

4
- 0033455150
- X. Wang, U. Helmersson, L. D. Madsen, I. P. Ivanov, P. Münger, S. Rudner, B. Hjörvarsson and J. E. Sundgren: J. Vac. Sci. & Technol. A 17 (1999) 564.
- (1999) J. Vac. Sci. & Technol. A , vol.17 , pp. 564
- Wang, X.¹ Helmersson, U.² Madsen, L.D.³ Ivanov, I.P.⁴ Münger, P.⁵ Rudner, S.⁶ Hjörvarsson, B.⁷ Sundgren, J.E.⁸

5
- 21844507579
- M. Matsuoka and S. Tohno: J. Vac. Sci. & Technol. A 13 (1995) 2427.
- (1995) J. Vac. Sci. & Technol. A , vol.13 , pp. 2427
- Matsuoka, M.¹ Tohno, S.²

6
- 0001508391
- Y. B. Hahn and D. O. Kim: J. Vac. Sci. & Technol. A 17 (1999) 1982.
- (1999) J. Vac. Sci. & Technol. A , vol.17 , pp. 1982
- Hahn, Y.B.¹ Kim, D.O.²

7
- 0000482355
- Y. Yoneda, T. Okabe, K. Sakaue, H. Terauchi, H. Kasatani and K. Deguchi: J. Appl. Phys. 83 (1998) 2458.
- (1998) J. Appl. Phys. , vol.83 , pp. 2458
- Yoneda, Y.¹ Okabe, T.² Sakaue, K.³ Terauchi, H.⁴ Kasatani, H.⁵ Deguchi, K.⁶

8
- 0001249424
- M. Tachiki, M. Noda, K. Yamada and T. Kubayashi: J. Appl. Phys. 83 (1998) 5351.
- (1998) J. Appl. Phys. , vol.83 , pp. 5351
- Tachiki, M.¹ Noda, M.² Yamada, K.³ Kubayashi, T.⁴

9
- 78649785930
- Y. Gao, A. H. Mueller, E. A. Irene, O. Auciello, A. Krauss and J. A. Schultz: J. Vac. Sci. & Technol. A 17 (1999) 1880.
- (1999) J. Vac. Sci. & Technol. A , vol.17 , pp. 1880
- Gao, Y.¹ Mueller, A.H.² Irene, E.A.³ Auciello, O.⁴ Krauss, A.⁵ Schultz, J.A.⁶

10
- 0021781807
- J. Musil: Vacuum 36 (1986) 161.
- (1986) Vacuum , vol.36 , pp. 161
- Musil, J.¹

11
- 0026953266
- Z. Y. Ning, Z. P. Luo, Y. C. Shi and Z. X. Ren: Vacuum 43 (1992) 1101.
- (1992) Vacuum , vol.43 , pp. 1101
- Ning, Z.Y.¹ Luo, Z.P.² Shi, Y.C.³ Ren, Z.X.⁴

12
- 0002327373
- M. Matsuoka and K. Ono: J. Vac. Sci. & Technol. A 6 (1988) 25.
- (1988) J. Vac. Sci. & Technol. A , vol.6 , pp. 25
- Matsuoka, M.¹ Ono, K.²

13
- 0027608309
- Y. Ohtsu, Y. Okuno and H. Fujita: Jpn. J. Appl. Phys. 32 (1993) 2873.
- (1993) Jpn. J. Appl. Phys. , vol.32 , pp. 2873
- Ohtsu, Y.¹ Okuno, Y.² Fujita, H.³

14
- 0031522452
- M. Mišina, Y. Setsuhara and S. Miyake: J. Vac. Sci. & Technol. A 15 (1997) 1922.
- (1997) J. Vac. Sci. & Technol. A , vol.15 , pp. 1922
- Mišina, M.¹ Setsuhara, Y.² Miyake, S.³

15
- 33645043467
- eds. V. Palleschi and M. Vaselli Institute of Atomic and Molecular Physics, Pisa
- V. A. Godyak and R. B. Piejak: Proc. 20th Int. Conf. Phenomena in Ionized Gases, eds. V. Palleschi and M. Vaselli (Institute of Atomic and Molecular Physics, Pisa, 1991) Vol. 5. p. 1075.
- (1991) Proc. 20th Int. Conf. Phenomena in Ionized Gases , vol.5 , pp. 1075
- Godyak, V.A.¹ Piejak, R.B.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.