Electron beam lithography of nanostructures using 2-propanol:water and 2-propanol:methyl isobutyl ketone as developers for poly-methylmethacrylate

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1255-1257

  Lavallée, Eric ^a   Beauvais, Jacques ^a   Beerens, Jean ^a  

^a UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000178728     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589996     Document Type: Article

References (7)

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