Adsorption processes of self-assembled monolayers made from terphenyl thiols

Langmuir

Volumn 17, Issue 24, 2001, Pages 7459-7463

  Ishida, Takao ^a,b   Mizutani, Wataru ^a   Azehara, Hiroaki ^a,c   Sato, Fuminobu ^c   Choi, Nami ^d   Akiba, Uichi ^c   Fujihira, Masamichi ^c   Tokumoto, Hiroshi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^d JRCAT   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MOLECULAR LATTICES;

ADSORPTION; ANISOTROPY; ORGANIC COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SOLVENTS;

SELF ASSEMBLY;

EID: 0035960784     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la010322w     Document Type: Article

References (45)

1. Ulman, A. Chem. Rev. 1996, 96, 1533.
2. Tour, J.M.; Jones, II, L.; Pearson, D.L.; Lamba, J.J.; Burgin, T.P.; Whitesides, G.M.; Allara, D.L.; Parkh, A.N.; Atre, S.V. J. Am. Chem. Soc. 1995, 117, 9529.
3. Zehner, R.W.; Parsons, B.F.; Hsung, R.P.; Sita, L.R. Langmuir 1999, 15, 1121.
4. Sabatani, E.; Cohne-Boulakia, J.; Bruening, M.; Rubinstein, I. Langmuir 1993, 9, 2974.
5. Tao, Y.-T.; Wu, C.-C.; Eu, J.-Y.; Lin, W.-L.; Wu, K.-C.; Chen, C. Langmuir 1997, 13, 4018.
6. Himmel, H.-J.; Terfort, A.; Wöll, Ch. J. Am. Chem. Soc. 1998, 120, 12069.
7. Geyer, W.; Stadler, V.; Eck, W.; Zharnikov, M.; Golzhauser, A.; Grunze, M. Appl. Phys. Lett. 1999, 75, 2401.
8. Kang, J.F.; Ulman, A.; Liao, S.; Jordan, R.; Yang, G.; Liu, L.-Y. Langmuir 2001, 17, 95.
9. Nakamura, T.; Kondoh, H.; Matsumoto, M.; Nozoe, H. Langmuir 1996, 12, 5977.
10. Dishner, M.H.; Hemminger, J.C.; Feher, F.J. Langmuir 1996, 12, 6176.
11. (a) Bumm, L.A.; Arnold, J.J.; Cygan, M.T.; Dunbar, T.D.; Jones, L., II; Allara, D.L.; Tour, J.M.; Weiss, P.S. Science 1996, 271, 1705.
12. (b) Cygan, M.T.; Dunbar, T.D.; Arnold, J.J.; Bumm, L.A.; Shedlock, N.F.; Burgin, T.P.; Jones, L., II; Allara, D.L.; Tour, J.M.; Weiss, P.S. J. Am. Chem. Soc. 1998, 120, 2721.
13. Leatherman, G.; Durantini, E.N.; Gust, D.; Moore, T.A.; Moore, A.L.; Stone, S.; Zhou, Z.; Lez, P.; Liu, Y.Z.; Lindsay, S.M. J. Phys. Chem. B 1999, 103, 4006.
14. Kelly, K.F.; Shom, T.-S.; Lee, T.R.; Halas, N.J. J. Phys. Chem. B 1999, 103, 8639.
15. Kergueris, C.; Bourgoin, J.P.; Palacin, S. Nanotechnology 1999, 10, 8.
16. Reed, M.A.; Zhou, C.; Muller, C.J.; Burgin, T.P., Tour, J.M. Science 1997, 278, 252.
17. Zhou, C.; Deshpande, M.R.; Reed, M.A.; Jones II, L.; Tour J.M. Appl. Phys. Lett. 1997, 71, 611.
18. Chen, J.; Reed, M.A.; Rawlett, A.M.; Tour, J.M. Science 1999, 286, 1550.
19. Ishida T.; Mizutani, W.; Akiba, U.; Umemura, K.; Inoue, A.; Choi, N.; Fujihira, M.; Tokumoto, H. J. Phys. Chem. B 1999, 103, 1686.
20. Mizutani, W.; Ishida, T.; Tokumoto, H. Jpn. J. Appl. Phys. 1999, 38, 3892.
21. Ishida, T.; Mizutani, W.; Tokumoto, H.; Choi, N.; Akiba, U.; Fujihira, M. J. Vac. Sci. Technol., A 2000, 18, 1437.
22. Ishida, T.; Mizutani, W.; Choi, N.; Akiba, U.; Fujihira, M.; Tokumoto, H. J. Phys. Chem. B 2000, 104, 11860.
23. Zharnikov, M.; Frey, S.; Rong, H.; Yang, Y.-J.; Heister, K.; Buck, M.; Grunze, M. Phys. Chem. Chem. Phys. 2000, 2, 3359.
24. Frey, S.; Stadler, K.; Heister, K.; Eck, W.; Zharnikov, M.; Grunze, M.; Zeysing, B.; Terfort, A. Langmuir 2001, 17, 2408.
25. Heister, K.; Zharnikov, M.; Grunze, M.; Johanson, L.S.O. J. Phys. Chem. B 2001, 105, 4058.
26. Leung, T.Y.B.; Schwartz, P.; Scoles, G.; Schreiber, F.; Ulman, A. Surf. Sci. 2000, 458, 34.
27. Dhirani, Al-A.; Zehner, R.W.; Hsung, R.P.; Guyot-Sionnest, P.; Sita, L.R. J. Am. Chem. Soc. 1996, 118, 3319.
28. Yang, G.; Qian, Y.; Engtrakul, C.; Sita, L.R.; Liu, G.-Y. J. Phys. Chem. B 2000, 104, 9059.
29. Bain, C.D.; Troughton, E.B.; Tao, Y.-T.; Evall, J.; Whitesides, G.M.; Nuzzo, R.G. J. Am. Chem. Soc. 1989, 111, 321.
30. Buck, M.; Eisert, F.; Fischer, J.; Grunze, M.; Träger, F. J. Appl. Phys. A 1991, 53, 552.
31. (a) Ishida, T.; Nishida, N.; Tsuneda, S.; Hara, M.; Sasabe H.; Knoll, W. Jpn. J. Appl. Phys. 1996, 35, L1710.
32. (b) Ishida, T.; Hara, M.; Kojima, I.; Tsuneda, S.; Nishida, N.; Sasabe H.; Knoll, W. Langmuir 1998, 14, 2092.
33. (a) Poirier, G.E.; Pylant, E.D. Science 1996, 272, 1145.
34. (b) Poirier, G.E. Langmuir 1997, 13, 2019.
35. (c) Poirier, G.E. Langmuir 1999, 15, 1167.
36. Kondoh, H.; Kodama, C.; Nozoye, H. J. Phys. Chem. B 1998, 102, 2310.
37. Tamada, K.; Hara, M.; Sasabe H.; Knoll, W. Langmuir 1997, 13, 1558.
38. (a) Yamada, R.; Uosaki, K. Langmuir 1997, 13, 5218.
39. (b)Yamada, R.; Uosaki, K. Langmuir 1998, 14, 855.
40. Kawasaki, M.; Sato, T.; Tanaka, T.; Takao, K. Langmuir 2000, 16, 1719.
41. Wöll, Ch.; Chiang, S.; Wilson, R.J.; Lippel, P.H. Phys. Rev. B 1989, 39, 7988.
42. Mizutani, W.; Ohi, A.; Motomatsu, M.; Tokumoto, H. Jpn. J. Appl. Phys. 1995, 34, L1151.
43. Poirier, G.E.; Tarlov, M.J. Langmuir 1994, 10, 2853.
44. Delamarche, E.; Michel, B.; Gerber, C.; Anselmetti, D.; Guntherodt, H.-J.; Wolf, H.; Ringsdorf, H. Langmuir 1994, 10, 2869.
45. Sellers, H.; Ulman, A.; Shindman Y.; Eilers, J.E. J. Am. Chem. Soc. 1993, 115 9389.