Recent advances in models for thermal oxidation of silicon

Journal of Computational Physics

Volumn 174, Issue 1, 2001, Pages 138-170

  Garikipati, Krishna ^a   Rao, Vinay S ^b  

^a University of Michigan   (United States)

^b SYNOPSYS INC   (United States)

Author keywords

Continuum mechanics of solids; Diffusion; Finite elements; Level set methods; Thermodynamics of solids

Indexed keywords

FINITE ELEMENT METHOD; NUMERICAL METHODS; SILICA; SILICON; SILICON OXIDES; STRAIN; THERMODYNAMICS; THERMOOXIDATION;

CONTINUUM MECHANIC OF SOLID; FINITE ELEMENT; LEVEL SET FORMULATIONS; LEVEL SET METHOD; MECHANICS OF SOLIDS; SI-SIO 2 INTERFACE; THERMAL-OXIDATION; THERMODYNAMIC OF SOLID; VELOCITY PROJECTIONS; WORKERS';

CONTINUUM MECHANICS;

EID: 0035923852     PISSN: 00219991     EISSN: None     Source Type: Journal    
DOI: 10.1006/jcph.2001.6884     Document Type: Article

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