Low K mesoporous silica films through template-based processing

Materials Research Society Symposium - Proceedings

Volumn 443, Issue , 1997, Pages 105-110

  Bruinsma, P J ^a   Hess, N J ^a   Bontha, J R ^a   Liu, J ^a   Baskaran, S ^a  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; DEPOSITION; DIELECTRIC PROPERTIES OF SOLIDS; ELLIPSOMETRY; HEAT TREATMENT; PERMITTIVITY; POROSITY; POROUS MATERIALS; REFRACTIVE INDEX; SILICA; SILICATES; SURFACE ACTIVE AGENTS;

CATIONIC CETYLTRIMETHYLAMMONIUM CHLORIDE; INTERLAYER DIELECTRICS; TETRAETHYL ORTHOSILICATE;

DIELECTRIC FILMS;

EID: 0030649327     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)