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Applied Physics Letters

Volumn 79, Issue 3, 2001, Pages 332-334

Thermal diffusivity in amorphous silicon carbon nitride thin films by the traveling wave technique

(8) Chattopadhyay, S a Chen, L C a Wu, C T b Chen, K H b Wu, J S a Chen, Y F a Lehmann, G c Hess, P c

a NATIONAL TAIWAN UNIVERSITY (Taiwan)

b INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES (Taiwan)

c UNIVERSITY OF HEIDELBERG (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CARBON NITRIDE; MICROSTRUCTURE; SILICON WAFERS; SPUTTER DEPOSITION; THERMAL DIFFUSION;

THERMAL DIFFUSIVITY;

THIN FILMS;

EID: 0035898427 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.1386619 Document Type: Article

Times cited : (21)

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