The effect of an electrostatic force on imaging a surface topography by noncontact atomic force microscope

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 9 A/B, 2001, Pages

  Shiota, Tadashi ^a,b   Nakayama, Keiji ^b  

^a JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

AFM; CPD; Electrostatic force; Noncontact; Quenched Si(111); SKPM

Indexed keywords

ATOMIC FORCE MICROSCOPY; CANTILEVER BEAMS; ELECTROSTATICS; FEEDBACK; QUENCHING;

CANTILEVER TIP; NONCONTACT ATOMIC FORCE MICROSCOPE; SCANNING KELVIN PROBE FORCE MICROSCOPE;

SURFACE TOPOGRAPHY;

EID: 0035885675     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l986     Document Type: Letter

References (17)