메뉴 건너뛰기




Volumn 304, Issue 1-2, 1997, Pages 371-380

Three-dimensional morphological instabilities in chemical vapor deposition films

Author keywords

Chemical vapor deposition (CVD); Diffusion; Surface diffusion; Surface morphology

Indexed keywords

BOUNDARY CONDITIONS; CHEMICAL VAPOR DEPOSITION; DIFFUSION IN SOLIDS; FILM GROWTH; MATHEMATICAL MODELS; MORPHOLOGY;

EID: 0031189561     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00192-2     Document Type: Article
Times cited : (7)

References (15)
  • 2
    • 0000427408 scopus 로고
    • Morphological stability analysis in chemical vapor deposition processes I
    • C.H.J. van den Brekel, A.K. Jansen, Morphological stability analysis in chemical vapor deposition processes I, J. Cryst. Growth 43 (1978) 364.
    • (1978) J. Cryst. Growth , vol.43 , pp. 364
    • Van Den Brekel, C.H.J.1    Jansen, A.K.2
  • 3
    • 0003903206 scopus 로고
    • Morphological stability analysis in chemical vapor deposition processes II
    • C.H.J. van den Brekel, A.K. Jansen, Morphological stability analysis in chemical vapor deposition processes II, J. Cryst. Growth 43 (1978) 371.
    • (1978) J. Cryst. Growth , vol.43 , pp. 371
    • Van Den Brekel, C.H.J.1    Jansen, A.K.2
  • 4
    • 0000902204 scopus 로고
    • Growth dynamics of chemical vapor deposition
    • G.S. Bales, A.C. Redfield, A. Zangwill, Growth dynamics of chemical vapor deposition, Phys. Rev. Lett. 62 (7) (1989) 776.
    • (1989) Phys. Rev. Lett. , vol.62 , Issue.7 , pp. 776
    • Bales, G.S.1    Redfield, A.C.2    Zangwill, A.3
  • 6
    • 4243979739 scopus 로고
    • Dynamics scaling of growing interfaces
    • M. Kardar, G. Parisi, V.C. Zhang, Dynamics scaling of growing interfaces, Phys. Rev. Lett. 56 (9) (1983) 889.
    • (1983) Phys. Rev. Lett. , vol.56 , Issue.9 , pp. 889
    • Kardar, M.1    Parisi, G.2    Zhang, V.C.3
  • 7
    • 0023996964 scopus 로고
    • Local equilibrium model of morphological instabilities in chemical vapor deposition
    • B.J. Palmer, R.G. Gordon, Local equilibrium model of morphological instabilities in chemical vapor deposition, Thin Solid Films 158 (1988) 313.
    • (1988) Thin Solid Films , vol.158 , pp. 313
    • Palmer, B.J.1    Gordon, R.G.2
  • 8
    • 0024751894 scopus 로고
    • Kinetic model of morphological instabilities in chemical vapor deposition
    • B.J. Palmer, R.G. Gordon, Kinetic model of morphological instabilities in chemical vapor deposition, Thin Solid Films 177 (1989) 141.
    • (1989) Thin Solid Films , vol.177 , pp. 141
    • Palmer, B.J.1    Gordon, R.G.2
  • 9
    • 0026837396 scopus 로고
    • Criteria for making uniform films by chemical vapor deposition
    • R. Ananth, W.N. Gill, Criteria for making uniform films by chemical vapor deposition, J. Cryst. Growth 118 (1992) 60.
    • (1992) J. Cryst. Growth , vol.118 , pp. 60
    • Ananth, R.1    Gill, W.N.2
  • 10
    • 0028450281 scopus 로고
    • Controlling the morphology of CVD films
    • H.J. Viljoen, J.J. Thiart, V. Hlavacek, Controlling the morphology of CVD films, AIChE J. 40 (6) (1994) 1032.
    • (1994) AIChE J. , vol.40 , Issue.6 , pp. 1032
    • Viljoen, H.J.1    Thiart, J.J.2    Hlavacek, V.3
  • 11
    • 0029359381 scopus 로고
    • Analysis of interface evolution and pattern formation during CVD
    • J.J. Thiart, V. Hlavacek, Analysis of interface evolution and pattern formation during CVD, AIChE J. 41 (8) (1995) 1926.
    • (1995) AIChE J. , vol.41 , Issue.8 , pp. 1926
    • Thiart, J.J.1    Hlavacek, V.2
  • 12
    • 11744360839 scopus 로고
    • Characterization of chemical vapor deposition processes: I and II
    • C.H.J. van den Brekel, Characterization of chemical vapor deposition processes: I and II, Philips Res. Rep. 32 (1977) 118.
    • (1977) Philips Res. Rep. , vol.32 , pp. 118
    • Van Den Brekel, C.H.J.1
  • 15
    • 0025416732 scopus 로고
    • Long-wave morphological instabilities in the directional solidification of a dilute binary mixture
    • D.S. Riley, S.H. Davis, Long-wave morphological instabilities in the directional solidification of a dilute binary mixture, Siam J. Appl. Math. 50 (2) (1990) 420.
    • (1990) Siam J. Appl. Math. , vol.50 , Issue.2 , pp. 420
    • Riley, D.S.1    Davis, S.H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.