Damage in hydrogen plasma implanted silicon

Journal of Applied Physics

Volumn 90, Issue 4, 2001, Pages 1735-1739

  Wang, Lianwei ^a,c,d   Fu, Ricky K Y ^a   Zeng, Xuchu ^a   Chu, Paul K ^a   Cheung, W Y ^b   Wong, S P ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

^c SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^d DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035881414     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1389073     Document Type: Article

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