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Volumn 71, Issue 1-3, 2000, Pages 196-202

Ultradense gas bubbles in hydrogen- or helium-implanted (or coimplanted) silicon

Author keywords

[No Author keywords available]

Indexed keywords

HELIUM; HYDROGEN; ION BOMBARDMENT; ION IMPLANTATION; POINT DEFECTS; RADIATION DAMAGE; SEMICONDUCTOR DOPING;

VACANCY CLUSTERS;

SEMICONDUCTING SILICON;

EID: 0033903661 PISSN: 09215107 EISSN: None Source Type: Journal
DOI: 10.1016/S0921-5107(99)00374-8 Document Type: Article

Times cited : (17)

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