Monitoring of atomic layer deposition by incremental dielectric reflection

Applied Surface Science

Volumn 107, Issue , 1996, Pages 178-183

  Rosental, A ^a   Adamson, P ^a   Gerst, A ^a   Niilisk, A ^a  

^a INSTITUTE OF PHYSICS   (Estonia)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; DEPOSITION; DIELECTRIC PROPERTIES OF SOLIDS; LIGHT POLARIZATION; LIGHT REFLECTION; REFLECTOMETERS; SUBSTRATES; TITANIUM DIOXIDE; TRANSPARENCY;

ATOMIC LAYER DEPOSITION; BREWSTER ANGLE; INCREMENTAL DIELECTRIC REFLECTION;

FILM GROWTH;

EID: 0030566290     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00483-7     Document Type: Article

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