Excimer laser deposition and characteristics of tin oxide thin films

Thin Solid Films

Volumn 320, Issue 2, 1998, Pages 216-219

  Dai, Guorui ^a   Jiang, Xilan ^a   Zhang, Yushu ^a  

^a JILIN UNIVERSITY   (China)

Author keywords

Excimer laser; Tin oxide thin films; Vapor deposition

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; EXCIMER LASERS; GRAIN SIZE AND SHAPE; OXYGEN; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING TIN COMPOUNDS; THIN FILMS; ULTRAVIOLET SPECTROSCOPY; X RAY CAMERAS; X RAY PHOTOELECTRON SPECTROSCOPY;

LASER ASSISTED CHEMICAL VAPOR DEPOSITION; TIN OXIDE;

SEMICONDUCTING FILMS;

EID: 0032070242     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01006-7     Document Type: Article

References (9)

1. C. Mellor, K.A. Petersen, US Patent applied. docket No. 85-1-153 (Sept. 1987).
2. J.P. Zheng, H.S. Kwok, Appl. Phys. Lett. 63 (1) (1993) 1-3.
3. D.K. Schroder, IEEE Trans. Electron Devices 25 (1978) 90.
4. R. Lal, R. Grover, R.D. Vispute, R. Viswanathan, V.P. Godbole, S.B. Ogale, Thin Solid Films 206 (1991) 88-91.
5. B.S. Chiou, S.T. Hsieh, Thin Solid Films 229 (1993) 146-155.
6. R.R. Kunz, M. Rothschild, D.J. Ehrlich, Appl. Phys. Lett. 54 (17) (1989).
7. R.R. Kunz, M. Rothschild, D.J. Ehrlich, Appl. Phys. Lett. 24 (1989) 1631-1633.
8. D. Belunger, J.P. Dodelet, J. Electrochem. Soc. 132 (1985) 1398.
9. S. Samson, C.G. Fonstad, J. Appl. Phys. 44 (1973) 4618.