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Volumn 34, Issue 14, 2001, Pages 2103-2108
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Retardation of Ta silicidation by bias sputtering in Cu/Ta/Si(111) thin films
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL STRUCTURE;
DENSITY (SPECIFIC GRAVITY);
DIFFUSION IN SOLIDS;
ELECTRIC CONDUCTIVITY MEASUREMENT;
INTERFACES (MATERIALS);
MORPHOLOGY;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SPUTTER DEPOSITION;
THERMAL EFFECTS;
THERMODYNAMIC STABILITY;
THIN FILMS;
BIAS SPUTTERING;
FOUR POINT PROBE RESISTIVITY MEASUREMENT;
RETARDATION;
SILICIDATION;
TANTALUM;
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EID: 0035859484
PISSN: 00223727
EISSN: None
Source Type: Journal
DOI: 10.1088/0022-3727/34/14/304 Document Type: Article |
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Times cited : (27)
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References (28)
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