A novel nanolithography technique for self-assembled monolayers using a current sensing atomic force microscope

Langmuir

Volumn 17, Issue 25, 2001, Pages 7784-7788

  Zhao, Jianwei ^a   Uosaki, Kohei ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

NANOMETER-SIZED PATTERNS;

ATOMIC FORCE MICROSCOPY; ELECTRIC POTENTIAL; ELECTROCHEMISTRY; LITHOGRAPHY; MICROSCOPES; MOLECULES; MONOLAYERS; NANOTECHNOLOGY; OPTIMIZATION; PROBABILITY; SOLVENTS; SURFACE TOPOGRAPHY; TOLUENE;

SELF ASSEMBLY;

EID: 0035846793     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la010635r     Document Type: Article

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