STM writing of artificial nanostructures in alkanethiol-type self-assembled monolayers

Applied Surface Science

Volumn 144-145, Issue , 1999, Pages 538-542

  Hartwich, J ^a   Sundermann, M ^a   Kleineberg, U ^a   Heinzmann, U ^a  

^a BIELEFELD UNIVERSITY   (Germany)

Author keywords

E beam lithography; SAM; STM lithography

Indexed keywords

ALCOHOLS; ELECTRIC CURRENTS; ELECTRIC POTENTIAL; GOLD; LITHOGRAPHY; MONOLAYERS; NANOTECHNOLOGY; SCANNING TUNNELING MICROSCOPY; SINGLE CRYSTALS; SURFACES; ULTRATHIN FILMS; VACUUM;

ARTIFICIAL NANOSTRUCTURES; ETHANOLIC SOLUTION; HEXADECANTHIOL; SELF ASSEMBLED MONOLAYERS; ULTRAHIGH VACUUM; ULTRATHIN RESIST FILMS;

NANOSTRUCTURED MATERIALS;

EID: 0032635528     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(98)00862-9     Document Type: Article

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