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Surface Science

Volumn 492, Issue 1-2, 2001, Pages 115-124

Electrochemical nucleation and growth of copper on Si(1 1 1)

(3) Ji, Chunxin a Oskam, Gerko a Searson, Peter C a

a Whiting School of Engineering (United States)

Author keywords

Active sites; Annealing; Atomic force microscopy; Copper; Electrodeposition; Nucleation; Silicon

Indexed keywords

ATOMIC FORCE MICROSCOPY; COPPER; DIFFUSION; ELECTRODEPOSITION; MONOLAYERS; NUCLEATION; SEMICONDUCTING SILICON;

ELECTROCHEMICAL NUCLEATION;

THIN FILMS;

EID: 0035840963 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01410-8 Document Type: Article

Times cited : (60)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.