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Volumn 356, Issue 1-3, 1996, Pages 101-111
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An STM study of current-induced step bunching on Si(111)
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Author keywords
Diffusion and migration; Models of non equilibrium phenomena; Scanning tunneling microscopy; Semiconducting surfaces; Silicon; Stepped single crystal surfaces; Surface structure, morphology, roughness
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Indexed keywords
ANISOTROPY;
ANNEALING;
DIFFUSION;
ELECTROMIGRATION;
MATHEMATICAL MODELS;
MORPHOLOGY;
SCANNING TUNNELING MICROSCOPY;
SEMICONDUCTING SILICON;
SINGLE CRYSTALS;
SURFACE ROUGHNESS;
SURFACE STRUCTURE;
SURFACES;
CURRENT INDUCED STEP BUNCHING;
NON EQUILIBRIUM PHENOMENA;
STEPPED SINGLE CRYSTAL SURFACES;
TERRACE SIZES;
SURFACE PHENOMENA;
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EID: 0030172354
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/0039-6028(96)00033-7 Document Type: Article |
Times cited : (124)
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References (40)
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