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Volumn 356, Issue 1-3, 1996, Pages 101-111

An STM study of current-induced step bunching on Si(111)

Author keywords

Diffusion and migration; Models of non equilibrium phenomena; Scanning tunneling microscopy; Semiconducting surfaces; Silicon; Stepped single crystal surfaces; Surface structure, morphology, roughness

Indexed keywords

ANISOTROPY; ANNEALING; DIFFUSION; ELECTROMIGRATION; MATHEMATICAL MODELS; MORPHOLOGY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SINGLE CRYSTALS; SURFACE ROUGHNESS; SURFACE STRUCTURE; SURFACES;

EID: 0030172354     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00033-7     Document Type: Article
Times cited : (124)

References (40)
  • 21
    • 0042469651 scopus 로고    scopus 로고
    • note
    • The curved appearance of steps in the images is due to the nonlinearity of the STM piezo scanner. To correct it, we used two scans, with one scan from left to right and the other right to left, of the same area of a surface having uniform steps. The two images were used to find one correction function which, when applied, gave the two scans the same appearance. This function was applied before quantitative determination of terrace widths was made. Only one function was used for all images and the curved appearance disappeared in all images after the correction.
  • 24
    • 0004091844 scopus 로고
    • Eds. R. Doremus, B. Roberts and D. Turnbull Wiley, New York
    • F.C. Frank, in: Growth and Perfection of Crystals, Eds. R. Doremus, B. Roberts and D. Turnbull (Wiley, New York, 1958).
    • (1958) Growth and Perfection of Crystals
    • Frank, F.C.1
  • 32
    • 0041969053 scopus 로고    scopus 로고
    • note
    • The simple model of Eq. (1) only allows a description of the evolution of the structure up to the point of the first step-pairing. A more detailed model is needed to describe the evolution of structure to step bunching.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.