Electrochemistry of gold deposition on n-Si(100)

Journal of the Electrochemical Society

Volumn 147, Issue 6, 2000, Pages 2199-2205

  Oskam, Gerko ^a   Searson, Peter C ^a  

^a Johns Hopkins University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMISTRY; GOLD; GROWTH (MATERIALS); INTERFACES (MATERIALS); MATHEMATICAL MODELS; NUCLEATION; REACTION KINETICS; SILICON; SOLUTIONS;

HELMHOLTZ LAYER; METAL ON METAL DEPOSITION;

ELECTRODEPOSITION;

EID: 0034206741     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393507     Document Type: Article

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