Co-sputtered films within the quasi-binary system TiN-TiB2

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 297-302

  Losbichler, P ^a   Mitterer, C ^a   Gibson, P N ^b   Gissler, W ^b   Hofer, F ^c   Warbichler, P ^c  

^a Institut fur Metallkunde und Werkstoffprufung   (Austria)

^b JOINT RESEARCH CENTRE   (Italy)

^c GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

Nanocrystalline coatings; Ti B N coatings; Ultrahard coatings; Unbalanced magnetron sputtering

Indexed keywords

BORIDES; CRYSTAL MICROSTRUCTURE; FILM GROWTH; GRAIN SIZE AND SHAPE; HARDNESS; MAGNETRON SPUTTERING; MICROANALYSIS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

DEPTH SENSING NANOINDENTER; ELECTRON PROBE MICROANALYSIS (EPMA); GLANCING ANGLE X RAY DIFFRACTION (GAXRD); NANOCRYSTALLINE COATINGS; TITANIUM BORIDE;

PROTECTIVE COATINGS;

EID: 0031246493     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00440-4     Document Type: Article

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