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Volumn 30, Issue 8, 1997, Pages

High silicon etch rates by hot filament generated atomic hydrogen

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL BONDS; COALESCENCE; COMPOSITION EFFECTS; ETCHING; HYDROGEN; HYDROGENATION; INTERFACES (MATERIALS); MOLECULAR STRUCTURE; POLYCRYSTALLINE MATERIALS; SEMICONDUCTOR DOPING; SUBSTRATES;

EID: 0031123701     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/8/002     Document Type: Article
Times cited : (42)

References (19)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.