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Volumn 30, Issue 8, 1997, Pages
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High silicon etch rates by hot filament generated atomic hydrogen
a a |
Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS SILICON;
CHEMICAL BONDS;
COALESCENCE;
COMPOSITION EFFECTS;
ETCHING;
HYDROGEN;
HYDROGENATION;
INTERFACES (MATERIALS);
MOLECULAR STRUCTURE;
POLYCRYSTALLINE MATERIALS;
SEMICONDUCTOR DOPING;
SUBSTRATES;
HOT TUNGSTEN FILAMENTS;
MICROCRYSTALLINE SILICON;
SEMICONDUCTING SILICON;
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EID: 0031123701
PISSN: 00223727
EISSN: None
Source Type: Journal
DOI: 10.1088/0022-3727/30/8/002 Document Type: Article |
Times cited : (42)
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References (19)
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