Process strategies for ultra-deep x-ray lithography at the advanced photon source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4557, Issue , 2001, Pages 77-84

  Mancini, Derrick C ^a   Moldovan, Nicolai A ^a   Divan, Ralu ^a   De Carlo, Francesco ^a   Yaeger, Judith ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

LIGA; Micromachining; X ray lithography

Indexed keywords

ASPECT RATIO; MASKS; MICROMACHINING; PHOTONS; SUBSTRATES; SYNCHROTRON RADIATION; X RAYS;

BENDING MAGNETS;

X RAY LITHOGRAPHY;

EID: 0035768053     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.442984     Document Type: Conference Paper

References (21)

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