Graphite-based x-ray masks for deep and ultradeep x-ray lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3618-3624

  Coane, Philip ^a   Giasolli, Robert ^a   De Carlo, Francesco ^b   Mancini, Derrick C ^b   Desta, Yohannes ^c   Götten, Jost ^d  

^a LOUISIANA TECH UNIVERSITY   (United States)

^b ARGONNE NATIONAL LABORATORY   (United States)

^c LOUISIANA STATE UNIVERSITY   (United States)

^d KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000543566     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590315     Document Type: Article

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