Beamline and exposure station for deep x-ray lithography at the advanced photon source

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2880, Issue , 1996, Pages 171-176

  Lai, Barry P ^a   Mancini, Derrick C ^a   Yun, Wen Bing ^a   Gluskin, Efim S ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROELECTRONICS; MICROSTRUCTURE; MIRRORS; PHOTONS; POLYMETHYL METHACRYLATES; SYNCHROTRON RADIATION;

ADVANCED PHOTON SOURCE; DEEP X RAY LITHOGRAPHY;

X RAY LITHOGRAPHY;

EID: 0030400199     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.250948     Document Type: Conference Paper

References (4)