PMMA development studies using various synchrotron sources and exposure conditions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3512, Issue , 1998, Pages 262-270

  Tan, Ming X ^a   Bankert, Michelle A ^a   Griffiths, Stewart K ^a   Ting, Aili ^a   Boehme, Dale R ^a   Wilson, Shondelle ^a   Balser, Lianna M ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FITS AND TOLERANCES; MICROMACHINING; POLYMETHYL METHACRYLATES; SYNCHROTRON RADIATION;

MICROFABRICATIONS;

X RAY LITHOGRAPHY;

EID: 0032289383     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324068     Document Type: Conference Paper

References (24)