Thermal management of masks for deep x-ray lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3151, Issue , 1997, Pages 92-101

  Khounsary, Ali M ^a   Chojnowski, David ^a   Mancini, Derrick C ^a   Lai, Barry P ^a   Dejus, Roger J ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Bending magnet radiation; Beryllium; Diamond; Graphite; High heat flux; Mask; Silicon; Thermal management; X ray lithography

Indexed keywords

ALKALINE EARTH METALS; ATOMIC PHYSICS; BERYLLIUM; DIAMONDS; ELECTROMAGNETIC WAVES; GRAPHITE; HEAT FLUX; MAGNETS; MASKS; RADIATION; SEMICONDUCTING SILICON COMPOUNDS; SYNCHROTRON RADIATION; SYNCHROTRONS; TEMPERATURE CONTROL; THERMAL LOAD; THERMAL VARIABLES CONTROL; THERMONUCLEAR REACTIONS; X RAY LITHOGRAPHY; X RAY OPTICS;

BENDING MAGNET RADIATION; DIAMOND; HIGH HEAT FLUX; MASK; SILICON; THERMAL MANAGEMENT;

X RAYS;

EID: 0010934243     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.294468     Document Type: Conference Paper

References (8)

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