메뉴 건너뛰기




Volumn 4346, Issue 2, 2001, Pages 1587-1598

Application of CD error budget analysis to ArF scanner performance

Author keywords

ArF; AWCDU; CD control; ECD; Error budget; OCD; Statistics

Indexed keywords

ARGON; ERROR ANALYSIS; ERROR STATISTICS; LITHOGRAPHY; SCANNING ELECTRON MICROSCOPY;

EID: 0035758717     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435700     Document Type: Conference Paper
Times cited : (10)

References (13)
  • 1
    • 0031359309 scopus 로고    scopus 로고
    • Potential causes of across-field CD variation
    • Optical Microlithography X, G. Fuller, SPIE, Santa Clara, CA
    • C. Progler, H. Du, and G. Wells, "Potential causes of across-field CD variation," Optical Microlithography X, G. Fuller, Proceedings of SPIE 3051, p. 660 - 671, SPIE, Santa Clara, CA, 1997.
    • (1997) Proceedings of SPIE , vol.3051 , pp. 660-671
    • Progler, C.1    Du, H.2    Wells, G.3
  • 2
    • 0029215571 scopus 로고
    • Impact of local partial coherence variation on exposure tool performance
    • Optical Microlithography VIII, G. Fuller, SPIE, Santa Clara, CA
    • Y. Borodovsky, "Impact of local partial coherence variation on exposure tool performance," Optical Microlithography VIII, G. Fuller, Proceedings of SPIE 2440, p. 750 - 770, SPIE, Santa Clara, CA, 1995.
    • (1995) Proceedings of SPIE , vol.2440 , pp. 750-770
    • Borodovsky, Y.1
  • 3
    • 0000793622 scopus 로고    scopus 로고
    • Analysis of reticle contributions to CD uniformity for 0.25 μm DUV lithography
    • Optical Microlithography XI, Luc Van den Hove, SPIE, Santa Clara, CA
    • J.P. Kuitjen, F. Duray, and T. der Kinderen, "Analysis of reticle contributions to CD uniformity for 0.25 μm DUV lithography," Optical Microlithography XI, Luc Van den Hove, Proceedings of SPIE 3334, p. 620 - 628, SPIE, Santa Clara, CA, 1998.
    • (1998) Proceedings of SPIE , vol.3334 , pp. 620-628
    • Kuitjen, J.P.1    Duray, F.2    Der Kinderen, T.3
  • 4
    • 0032647899 scopus 로고    scopus 로고
    • CD error budget analysis for 0.18 μm inlaid trench lithography
    • Conference on Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, SPIE, Santa Clara, CA
    • S. Postnikov, et al., "CD error budget analysis for 0.18 μm inlaid trench lithography," Conference on Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, Proceedings of SPIE 3677, p. 395 - 405, SPIE, Santa Clara, CA, 1999.
    • (1999) Proceedings of SPIE , vol.3677 , pp. 395-405
    • Postnikov, S.1
  • 5
    • 0032632131 scopus 로고    scopus 로고
    • CD-uniformity considerations for DUV step & scan tools
    • Optical Microlithography XII, L. Van den Hove, SPIE, Santa Clara, CA
    • R. Seltmann, et al., "CD-uniformity considerations for DUV step & scan tools," Optical Microlithography XII, L. Van den Hove, Proceedings of SPIE 3679, p. 239 - 249, SPIE, Santa Clara, CA, 1999.
    • (1999) Proceedings of SPIE , vol.3679 , pp. 239-249
    • Seltmann, R.1
  • 6
    • 0010511790 scopus 로고    scopus 로고
    • Lithographic effects of mask critical dimension error
    • Optical Microlithography XI, L. Van den Hove, SPIE, Santa Clara, CA
    • A.K. Wong, et al., "Lithographic effects of mask critical dimension error," Optical Microlithography XI, L. Van den Hove, Proceedings of SPIE 3334, p. 106 - 116, SPIE, Santa Clara, CA, 1998.
    • (1998) Proceedings of SPIE , vol.3334 , pp. 106-116
    • Wong, A.K.1
  • 7
    • 79958843065 scopus 로고
    • Micrascan II overlay error analysis
    • Optical/Laser Microlithography VII, T.A. Brunner, SPIE, Santa Clara, CA
    • D.J. Cronin and G.M. Gallatin, "Micrascan II overlay error analysis," Optical/Laser Microlithography VII, T.A. Brunner, Proceedings of SPIE 2197, p. 932 - 942, SPIE, Santa Clara, CA, 1994.
    • (1994) Proceedings of SPIE , vol.2197 , pp. 932-942
    • Cronin, D.J.1    Gallatin, G.M.2
  • 8
    • 0033682547 scopus 로고    scopus 로고
    • Linewidth uniformity error analysis for step-and-scan systems
    • Optical Microlithography XIII, C. Progler, SPIE, Santa Clara
    • J.D. Zimmerman, et al., "Linewidth uniformity error analysis for step-and-scan systems," Optical Microlithography XIII, C. Progler, Proceedings of SPIE 4000, p. 785 - 792, SPIE, Santa Clara, 2000.
    • (2000) Proceedings of SPIE , vol.4000 , pp. 785-792
    • Zimmerman, J.D.1
  • 9
    • 0029749508 scopus 로고    scopus 로고
    • Wafer flatness modeling for scanning steppers
    • Metrology, Inspection, and Process Control for Microlithography X, S.K. Jones, SPIE, Santa Clara, CA
    • R.K. Goodall and H.R. Huff, "Wafer flatness modeling for scanning steppers,"Metrology, Inspection, and Process Control for Microlithography X, S.K. Jones, Proceedings of SPIE 2725, p. 76 - 85, SPIE, Santa Clara, CA, 1997.
    • (1997) Proceedings of SPIE , vol.2725 , pp. 76-85
    • Goodall, R.K.1    Huff, H.R.2
  • 10
    • 0028758530 scopus 로고
    • The importance of mask technical specifications on the lithography error budget
    • 14th Annual BACUS Symposium on Photomask Technology and Management, W.L. Brodksy and G.V. Shelden, SPIE, Santa Clara, CA
    • G. Escher, "The importance of mask technical specifications on the lithography error budget," 14th Annual BACUS Symposium on Photomask Technology and Management, W.L. Brodksy and G.V. Shelden, Proceedings of SPIE 2322, p. 409 - 420, SPIE, Santa Clara, CA, 1994.
    • (1994) Proceedings of SPIE , vol.2322 , pp. 409-420
    • Escher, G.1
  • 11
    • 0002426559 scopus 로고    scopus 로고
    • Contributors to focal-plane nonuniformity and their impact on linewidth control in a DUV step-& scan system
    • Optical Microlithography XI, L. Van den Hove, SPIE, Santa Clara, CA
    • P. Govil, et al., "Contributors to focal-plane nonuniformity and their impact on linewidth control in a DUV step-& scan system," Optical Microlithography XI, L. Van den Hove, Proceedings of SPIE 3334, p. 92 - 103, SPIE, Santa Clara, CA, 1998.
    • (1998) Proceedings of SPIE , vol.3334 , pp. 92-103
    • Govil, P.1
  • 12
    • 0033273523 scopus 로고    scopus 로고
    • Technique for optical characterization of exposure tool imaging performance down to 100 nm
    • I. Grodnensky, et al., "Technique for optical characterization of exposure tool imaging performance down to 100 nm," Journal of Vacuum Science & Technology B, 17(6), p. 3285 - 3290, 1999.
    • (1999) Journal of Vacuum Science & Technology B , vol.17 , Issue.6 , pp. 3285-3290
    • Grodnensky, I.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.