-
1
-
-
0031359309
-
Potential causes of across-field CD variation
-
Optical Microlithography X, G. Fuller, SPIE, Santa Clara, CA
-
C. Progler, H. Du, and G. Wells, "Potential causes of across-field CD variation," Optical Microlithography X, G. Fuller, Proceedings of SPIE 3051, p. 660 - 671, SPIE, Santa Clara, CA, 1997.
-
(1997)
Proceedings of SPIE
, vol.3051
, pp. 660-671
-
-
Progler, C.1
Du, H.2
Wells, G.3
-
2
-
-
0029215571
-
Impact of local partial coherence variation on exposure tool performance
-
Optical Microlithography VIII, G. Fuller, SPIE, Santa Clara, CA
-
Y. Borodovsky, "Impact of local partial coherence variation on exposure tool performance," Optical Microlithography VIII, G. Fuller, Proceedings of SPIE 2440, p. 750 - 770, SPIE, Santa Clara, CA, 1995.
-
(1995)
Proceedings of SPIE
, vol.2440
, pp. 750-770
-
-
Borodovsky, Y.1
-
3
-
-
0000793622
-
Analysis of reticle contributions to CD uniformity for 0.25 μm DUV lithography
-
Optical Microlithography XI, Luc Van den Hove, SPIE, Santa Clara, CA
-
J.P. Kuitjen, F. Duray, and T. der Kinderen, "Analysis of reticle contributions to CD uniformity for 0.25 μm DUV lithography," Optical Microlithography XI, Luc Van den Hove, Proceedings of SPIE 3334, p. 620 - 628, SPIE, Santa Clara, CA, 1998.
-
(1998)
Proceedings of SPIE
, vol.3334
, pp. 620-628
-
-
Kuitjen, J.P.1
Duray, F.2
Der Kinderen, T.3
-
4
-
-
0032647899
-
CD error budget analysis for 0.18 μm inlaid trench lithography
-
Conference on Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, SPIE, Santa Clara, CA
-
S. Postnikov, et al., "CD error budget analysis for 0.18 μm inlaid trench lithography," Conference on Metrology, Inspection, and Process Control for Microlithography XIII, B. Singh, Proceedings of SPIE 3677, p. 395 - 405, SPIE, Santa Clara, CA, 1999.
-
(1999)
Proceedings of SPIE
, vol.3677
, pp. 395-405
-
-
Postnikov, S.1
-
5
-
-
0032632131
-
CD-uniformity considerations for DUV step & scan tools
-
Optical Microlithography XII, L. Van den Hove, SPIE, Santa Clara, CA
-
R. Seltmann, et al., "CD-uniformity considerations for DUV step & scan tools," Optical Microlithography XII, L. Van den Hove, Proceedings of SPIE 3679, p. 239 - 249, SPIE, Santa Clara, CA, 1999.
-
(1999)
Proceedings of SPIE
, vol.3679
, pp. 239-249
-
-
Seltmann, R.1
-
6
-
-
0010511790
-
Lithographic effects of mask critical dimension error
-
Optical Microlithography XI, L. Van den Hove, SPIE, Santa Clara, CA
-
A.K. Wong, et al., "Lithographic effects of mask critical dimension error," Optical Microlithography XI, L. Van den Hove, Proceedings of SPIE 3334, p. 106 - 116, SPIE, Santa Clara, CA, 1998.
-
(1998)
Proceedings of SPIE
, vol.3334
, pp. 106-116
-
-
Wong, A.K.1
-
7
-
-
79958843065
-
Micrascan II overlay error analysis
-
Optical/Laser Microlithography VII, T.A. Brunner, SPIE, Santa Clara, CA
-
D.J. Cronin and G.M. Gallatin, "Micrascan II overlay error analysis," Optical/Laser Microlithography VII, T.A. Brunner, Proceedings of SPIE 2197, p. 932 - 942, SPIE, Santa Clara, CA, 1994.
-
(1994)
Proceedings of SPIE
, vol.2197
, pp. 932-942
-
-
Cronin, D.J.1
Gallatin, G.M.2
-
8
-
-
0033682547
-
Linewidth uniformity error analysis for step-and-scan systems
-
Optical Microlithography XIII, C. Progler, SPIE, Santa Clara
-
J.D. Zimmerman, et al., "Linewidth uniformity error analysis for step-and-scan systems," Optical Microlithography XIII, C. Progler, Proceedings of SPIE 4000, p. 785 - 792, SPIE, Santa Clara, 2000.
-
(2000)
Proceedings of SPIE
, vol.4000
, pp. 785-792
-
-
Zimmerman, J.D.1
-
9
-
-
0029749508
-
Wafer flatness modeling for scanning steppers
-
Metrology, Inspection, and Process Control for Microlithography X, S.K. Jones, SPIE, Santa Clara, CA
-
R.K. Goodall and H.R. Huff, "Wafer flatness modeling for scanning steppers,"Metrology, Inspection, and Process Control for Microlithography X, S.K. Jones, Proceedings of SPIE 2725, p. 76 - 85, SPIE, Santa Clara, CA, 1997.
-
(1997)
Proceedings of SPIE
, vol.2725
, pp. 76-85
-
-
Goodall, R.K.1
Huff, H.R.2
-
10
-
-
0028758530
-
The importance of mask technical specifications on the lithography error budget
-
14th Annual BACUS Symposium on Photomask Technology and Management, W.L. Brodksy and G.V. Shelden, SPIE, Santa Clara, CA
-
G. Escher, "The importance of mask technical specifications on the lithography error budget," 14th Annual BACUS Symposium on Photomask Technology and Management, W.L. Brodksy and G.V. Shelden, Proceedings of SPIE 2322, p. 409 - 420, SPIE, Santa Clara, CA, 1994.
-
(1994)
Proceedings of SPIE
, vol.2322
, pp. 409-420
-
-
Escher, G.1
-
11
-
-
0002426559
-
Contributors to focal-plane nonuniformity and their impact on linewidth control in a DUV step-& scan system
-
Optical Microlithography XI, L. Van den Hove, SPIE, Santa Clara, CA
-
P. Govil, et al., "Contributors to focal-plane nonuniformity and their impact on linewidth control in a DUV step-& scan system," Optical Microlithography XI, L. Van den Hove, Proceedings of SPIE 3334, p. 92 - 103, SPIE, Santa Clara, CA, 1998.
-
(1998)
Proceedings of SPIE
, vol.3334
, pp. 92-103
-
-
Govil, P.1
-
12
-
-
0033273523
-
Technique for optical characterization of exposure tool imaging performance down to 100 nm
-
I. Grodnensky, et al., "Technique for optical characterization of exposure tool imaging performance down to 100 nm," Journal of Vacuum Science & Technology B, 17(6), p. 3285 - 3290, 1999.
-
(1999)
Journal of Vacuum Science & Technology B
, vol.17
, Issue.6
, pp. 3285-3290
-
-
Grodnensky, I.1
|