Technique for optical characterization of exposure tool imaging performance down to 100 nm

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3285-3290

  Grodnensky, I ^a   Suwa, K ^b   Farrar, N ^c   Johnson, E ^a   Pan, J ^a  

^a NIKON PRECISION INC   (United States)

^b Nikon C/O   (Japan)

^c HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033273523     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590996     Document Type: Article

References (3)

1. I. Grodnensky, K. Suwa, K. Ushida, and E. Johnson, patent pending.
2. I. Grodnensky, E. Monta, K. Suwa, and S. Hirukawa, Proc. SPIE 3334, 289 (1998).
3. K. Suwa, H. Tateno, N. Irie, and S. Hirukawa, Proc. SPIE 2440, 712 (1995).