Contributors to focal plane nonuniformity and their impact on linewidth control in a DUV step & scan system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 92-103

  Govil, Pradeep K ^a   Tsacoyeanes, James G ^a   Eron, Randell P ^a   Walters, Dave ^a  

^a SVG Lithography Systems Inc   (United States)

Author keywords

Enor budgets; Focal plane nonuniformity; Joint distribution; Linewidth control; Statistical metrology

Indexed keywords

BUDGET CONTROL; IMAGE SEGMENTATION; LINEWIDTH; OPTICAL INSTRUMENTS; PHOTOMASKS; PROBABILITY DENSITY FUNCTION; PROBABILITY DISTRIBUTIONS;

ENOR BUDGETS; FOCAL PLANE NONUNIFORMITY; JOINT DISTRIBUTION; LINEWIDTH CONTROL; STATISTICAL METROLOGY;

FOCUSING;

EID: 0002426559     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310794     Document Type: Conference Paper

References (0)