Wafer flatness modeling for scanning steppers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2725, Issue , 1996, Pages 76-84

  Goodall, Randal K ^a   Huff, Howard R ^a  

^a USA ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SCANNING STEPPERS; WAFER FLATNESS;

PERFORMANCE; PHOTOLITHOGRAPHY; SCANNING; SEMICONDUCTING SILICON; ULSI CIRCUITS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0029749508     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (23)