CD error budget analysis for 0.18 μm inlaid trench lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3677, Issue I, 1999, Pages 395-405

  Postnikov, Sergei ^a   Sturtevant, John ^a   Lucas, Kevin ^a   Fu, Chong Cheng ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ERROR ANALYSIS; IMAGE QUALITY; IMAGING TECHNIQUES; OPTIMIZATION; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSIONAL (CD) CONTROL; INLAID TRENCHES;

PHOTOLITHOGRAPHY;

EID: 0032647899     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350827     Document Type: Conference Paper

References (4)