CD-uniformity consideration for DUV step & scan tools

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3679, Issue I, 1999, Pages 239-249

  Seltmann, Rolf ^a   Minvielle, Anna ^a   Spence, Christopher ^a   Muehle, Sven ^a   Capodieci, Luigi ^a   Nguyen, Khanh ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE ANALYSIS; MASKS; ULTRAVIOLET RADIATION;

MASK ERROR FACTORS (MEF);

PHOTOLITHOGRAPHY;

EID: 0032632131     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.354337     Document Type: Conference Paper

References (4)