SCOPUS 정보 검색 플랫폼

Journal of Photopolymer Science and Technology

Volumn 14, Issue 4, 2001, Pages 631-642

Materials and resists for 193 and 157nm applications

(12) Padmanaban, Munirathna a Alemy, Eric a Bae, Jun Bom a Kim, Woo Kyu a Kudo, Takanori a Masuda, Seiya a Rahman, Dalil a Sakamuri, Raj a Dammel, Ralph a Jung, Jae Chang b Lee, Sung Koo b Shin, Ki Soo b

a CLARIANT CORPORATION (United States)

b Hynix Semiconductor Inc (South Korea)

Author keywords

157 nm; 193nm; AX 1020P; AX 1040P; AX 2020P; Polymers; Resists

Indexed keywords

CARBON MONOXIDE; CARBOXYLIC ACID DERIVATIVE; MALEIC ACID DERIVATIVE; METHACRYLIC ACID DERIVATIVE; NORBORNENE DERIVATIVE; POLYMER;

ARTICLE; CHEMICAL STRUCTURE; ELECTRONICS; LITHOGRAPHY; MATERIALS; POLYMERIZATION; SEMICONDUCTOR; SYNTHESIS;

EID: 0035746850 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.14.631 Document Type: Article

Times cited : (10)

References (39)

1
- 2842567164
- (1993) Proc. SPIE , vol.1925 , pp. 167
- Kunz, R.R.¹ Allen, R.D.² Hinsberg, W.D.³ Walraff, G.M.⁴

2
- 0029227194
- (1995) Proc. SPIE , vol.2438 , pp. 474
- Allen, R.D.¹ Walraff, G.M.² DiPietro, R.A.³ Hofer, D.C.⁴ Kunz, R.R.⁵

3
- 0000679152
- (1996) J. Photopolym. Sci. Technol. , vol.9 , pp. 509
- Nozaki, K.¹ Watanabe, K.² Yano, E.³ Kotachi, A.⁴ Takechi, S.⁵ Hanyu, I.⁶

4
- 0002656026
- (1998) Proc. SPIE , vol.3333 , pp. 43
- Nakano, K.¹ Iwasa, S.² Maeda, K.³ Hasegawa, E.⁴

5
- 0031248699
- (1997) Macromolecules , vol.30 , pp. 6517
- Houlihan, F.M.¹ Wallow, T.I.² Nalamasu, O.³ Reichmanis, R.⁴

6
- 0000697586
- (1997) J. Photopolym. Sci. Technol. , vol.10 , pp. 529
- Jung, J.C.¹ Bok, C.K.² Baik, K.H.³

7
- 60949092321
- (1998) Proc. SPIE , vol.3333 , pp. 26
- Suwa, M.¹ Iwasawa, H.² Kajita, T.³ Yamamoto, M.⁴ Iwanaga, S.I.⁵

8
- 60849129827
- (1998) Proc. SPIE , vol.3333 , pp. 92
- Wallow, T.I.¹ Brock, P.J.² Dipietro, R.A.³ Allen, R.D.⁴ Opitz, J.⁵ Sooryakumaran, R.⁶ Hofer, D.C.⁷ Meute, J.⁸ Byers, J.D.⁹ Rich, G.¹⁰ McCallum, M.¹¹ Schuetze, S.¹² Jayaraman, S.¹³ Hullihen, K.¹⁴ Vicari, R.¹⁵ Rohdes, L.F.¹⁶ Goodall, B.L.¹⁷ Schick, R.A.¹⁸

9
- 0033689386
- (2000) Proc. SPIE , vol.3999 , pp. 365
- Patterson, K.¹ Yamachika, M.² Hung, R.³ Brodsky, C.⁴ Yamada, S.⁵ Somervell, M.⁶ Osborn, B.⁷ Hall, D.⁸ Dukovic, G.⁹ Byers, J.¹⁰ Conley, W.¹¹ Willson, C.G.¹²

10
- 85036964472
- to be published
- (2001) Proc. SPIE , pp. 4345
- Sakamuri, R.¹ Romano, A.² Dammel, R.R.³ Conley, W.⁴ Vicari, R.⁵

11
- 0032629240
- (1999) Proc. SPIE , vol.3678 , pp. 44
- Rushkin, I.L.¹ Houlihan, F.M.² Kometani, J.M.³ Hutton, R.S.⁴ Timko, A.G.⁵ Reichmanis, E.⁶ Nalamasu, O.⁷ Gabor, A.H.⁸ Medina, A.N.⁹ Slater, S.G.¹⁰ Neisser, M.¹¹

12
- 85037003395
- to be published
- (2001) Proc. SPIE , pp. 4345
- Dalil Rahman, M.¹ McKenzie, D.² Bae, J.-B.³ Kudo, T.⁴ Kim, W.-K.⁵ Padmanaban, M.⁶ Dammel, R.R.⁷

13
- 0032677828
- (1999) Proc. SPIE , vol.3678 , pp. 1352
- Paniez, P.J.¹ Gally, S.² Mortini, B.³ Rosilio, C.⁴ Sassoulas, P.-O.⁵ Dammel, R.⁶ Padmanaban, M.⁷ Klauck-Jacobs, A.⁸ Oberlander, J.⁹

14
- 0000181143
- (2000) Proc. SPIE , vol.3999 , pp. 220
- Dalil Rahman, M.¹ Bae, J.-B.² Cook, M.³ Durham, D.L.⁴ Kudo, T.⁵ Kim, W.-K.⁶ Padmanaban, M.⁷ Dammel, R.R.⁸

15
- 4143150811
- (1997) J. Vac. Sci. Technol. B , vol.15 , Issue.6 , pp. 2112-2116
- Bloomstein, T.M.¹ Horn, M.W.² Rothschild, M.³ Kunz, R.R.⁴ Palmacci, S.T.⁵ Goodman, R.B.⁶

16
- 11744307460
- (1998) J. Vac. Sci. Technol. B , vol.16 , Issue.6 , pp. 3154-3157
- Bloomstein, T.M.¹ Rothschild, M.² Kunz, R.R.³ Hardy, D.E.⁴ Goodman, R.B.⁵ Palmacci, S.T.⁶

17
- 0033689386
- (2000) Proc. SPIE , vol.3999 , pp. 365
- Patterson, K.¹ Yamachika, M.² Hung, R.³ Brodsky, C.⁴ Yamada, S.⁵ Somervell, M.⁶ Osborn, B.⁷ Hall, D.⁸ Dukovica, G.⁹ Byers, J.¹⁰ Conley, W.¹¹ Willson, C.G.¹²

18
- 0010122868
- Dana Point, CA, May, and references quoted
- (2000) First International Symposium on 157 nm Lithography
- Conley, W.¹

19
- 0000604618
- (2000) Proc. SPIE , vol.3999 , pp. 357
- Crawford, M.K.¹ Feiring, A.E.² Feldman, J.³ French, R.H.⁴ Periyasamy, M.⁵ Schadt F.L. III⁶ Smalley, R.J.⁷ Zumsteg, F.C.⁸ Kunz, R.R.⁹ Rao, V.¹⁰ Liao, L.¹¹ Holl, S.M.¹²

20
- 85036965912
- in print
- (2001) J. Photopolym. Sci. Technol.
- Tran, H.V.¹ Yamada, S.² Chiba, T.³ Hung, R.J.⁴ Trinque, B.C.⁵ Brodsky, C.J.⁶ Conley, W.⁷ Willson, C.G.⁸

21
- 85036993828
- in print
- (2001) Proc. SPIE 4345
- Hung, R.J.¹ Yamada, S.² Trinque, B.C.³ Chiba, T.⁴ Brodsky, C.J.⁵ Vander Heyden, A.⁶ Tran, H.V.⁷ Pinnow, M.J.⁸ Tattersall, P.I.⁹ Jean, T.S.¹⁰ Jamieson, A.¹¹ Byers, J.D.¹² Conley, W.¹³ Willson, C.G.¹⁴

22
- 85036959104
- PCT WO 97/33198 (B. F. Goodrich)
- Goodall, B.¹ Jayaraman, S.² Shick, R.A.³ Rhodes, L.F.⁴

23
- 0032675485
- (1999) Proc. SPIE , vol.3678 , pp. 13
- Kunz, R.R.¹

24
- 0000253787
- (2000) Proc. SPIE , vol.3999 , pp. 335
- Fedynyshyn, T.H.¹ Kunz, R.R.² Doran, S.P.³ Goodman, R.B.⁴ Lind, M.L.⁵ Curtin, J.E.⁶

25
- 0001998151
- and references quoted
- (2000) Proc. SPIE 3999 , pp. 2
- Ito, H.¹ Allen, R.D.² Opitz, J.³ Wallow, T.I.⁴ Truong, H.D.⁵ Hofer, D.C.⁶ Varanasi, P.R.⁷ Jordhamo, G.M.⁸ Jayaraman, S.⁹ Vicari, R.¹⁰

26
- 85036965454
- EP 0,789,278 A (JSR, 1997)

27
- 85036962611
- PCT WO 00/67072 (DuPont)
- Feiring, A.E.¹ Feldman, J.²

28
- 85037002633
- PCT WO 00/17712 (DuPont)

29
- 85036979120
- in print
- (2001) J. Photopolym. Sci. Technol
- Ober, C.K.¹ Bae, Y.C.² Schmaljohann, D.³ Koerner, H.⁴ Hamad, S.⁵ Weibeland, G.⁶ Pham, V.⁷

30
- 85036977661
- in print
- (2001) Proc. SPIE , pp. 4345
- Fender, N.S.¹ Walraff, G.M.² Hinsberg, W.H.³ Ito, H.⁴ Brock, P.J.⁵ Burnham, K.⁶ Chau, W.⁷ Iarson, C.E.⁸ Marhorowala, A.⁹ Allen, R.D.¹⁰

31
- 85036985366
- in print
- (2001) Proc. SPIE , pp. 4345
- Kunz, R.R.¹ Sinta, R.² Sworin, M.³ Fedynyshyn, T.H.⁴ Liberman, V.⁵ Curtin, J.E.⁶

32
- 85036971990
- De 4207261 (1993)
- Przybilla, K.¹ Pawlowski, G.² Dammel, R.³ Appel, W.⁴

33
- 85036991593
- De4207263 (1993)

34
- 85036967423
- De 4207264 (1993)

35
- 0000925085
- (1992) Adv. Mater. , vol.4 , Issue.3 , pp. 239
- Przybilla, K.¹ Roeschert, H.² Pawlowski, G.³

36
- 0010179557
- (1992) J. Photopolym. Sci. Technol. , vol.5 , Issue.1 , pp. 85

37
- 0000320187
- (1992) Proc. SPIE , vol.1672 , pp. 500

38
- 85036959419
- San Diego, CA, November 14-16
- (2000) 157 nm Technical Data Review
- Dammel, R.¹

39
- 85036988671
- in print
- (2001) J. Photopol. Sci. Technol.
- Dammel, R.R.¹ Sakamuri, R.² Kudo, T.³ Romano, A.⁴ Rhodes, L.⁵ Vicari, R.⁶ Hacker, C.⁷ Conley, W.⁸ Miller, D.⁹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.