Adhesion characteristics of alicyclic polymers for use in ArF excimer laser lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 43-52

  Nakano, Kaichiro ^a   Iwasa, Shigeyuki ^a   Maeda, Katsumi ^a   Hasegawa, Etsuo ^a  

^a NEC CORPORATION   (Japan)

Author keywords

Alicyclic polymer; ArF excimer laser lithography; Interfacial free energy; Work of adhesion

Indexed keywords

EXCIMER LASERS; FREE ENERGY; FUNCTIONAL GROUPS; FUNCTIONAL POLYMERS; GAS LASERS; HYDROGEN; HYDROGEN BONDS; INTERFACIAL ENERGY; LITHOGRAPHY; PHOTORESISTORS; PHOTORESISTS; POLYMER FILMS; THICKNESS MEASUREMENT;

ADHESION CHARACTERISTICS; ALICYCLIC POLYMER; AQUEOUS SOLUTIONS; ARF EXCIMER LASER LITHOGRAPHY; CHEMICALLY AMPLIFIED RESISTS; INTERFACIAL FREE ENERGY; RELATIVE DIELECTRIC CONSTANTS; SURFACE FREE ENERGIES; TETRA-METHYL AMMONIUM HYDROXIDES; WORK OF ADHESION;

ADHESION;

EID: 0002656026     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312438     Document Type: Conference Paper

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