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Volumn 19, Issue 6, 2001, Pages 2829-2833

Dual exposure glass layer suspended structures: A simplified fabrication process for suspended nanostructures on planar substrates

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; GLASS; INTERFEROMETRY; NANOSTRUCTURED MATERIALS; NATURAL FREQUENCIES; PIEZOELECTRICITY; SUBSTRATES; THICKNESS MEASUREMENT;

EID: 0035519502     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1417546     Document Type: Article
Times cited : (14)

References (15)
  • 9
    • 33847595764 scopus 로고    scopus 로고
    • HSQ is commercially available from Dow Corning as FOx-n, and is used as an interlayer dielectric in semiconductor manufacturing
    • HSQ is commercially available from Dow Corning as FOx-n, and is used as an interlayer dielectric in semiconductor manufacturing.
  • 14
    • 33847582257 scopus 로고    scopus 로고
    • private communication, preprint
    • L. Sekaric and H. G. Craighead (private communication, preprint).
    • Sekaric, L.1    Craighead, H.G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.