Laser-produced lithium plasma as a narrow-band extended ultraviolet radiation source for photoelectron spectroscopy

Applied Optics

Volumn 37, Issue 7, 1998, Pages 1243-1248

  Schriever, G ^b   Mager, S ^a   Naweed, A ^a   Engel, A ^b   Bergmann, K ^b   Lebert, R ^b  

^a FRAUNHOFER INSTITUTE FOR LASER TECHNOLOGY   (Germany)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELD EFFECTS; ELECTRON ENERGY LEVELS; ELECTRON MICROSCOPES; ELECTRONS; LASER PRODUCED PLASMAS; LIGHT EMISSION; LIGHT REFLECTION; MIRRORS; OPTICAL RESOLVING POWER; PHOTONS; ULTRAVIOLET RADIATION;

KINETIC ENERGY; PHOTOELECTRON EMISSION MICROSCOPE; PHOTOELECTRONS; SPECTRAL DISTRIBUTION;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0032022676     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.001243     Document Type: Article

References (21)

1. B. L. Henke, E. M. Gullikson, and J. C. Davis, “X-ray interactions: photoabsorption, scattering, transmission, and reflection at E = 50-30, 000 eV, Z = 1-92, ” At. Data Nucl. Data Tables 54, 181-342 (1993).
2. R. Lebert, W. Neff, and D. Rothweiler, “Pinch plasma source for x-ray microscopy with nanosecond exposure time, ” J. X-Ray Sci. Technol. 6, 107-140 (1996).
3. H. Kondo, T. Tomie, and H. Shimizu, “Time of flight photoelectron spectroscopy with a laser-plasma x-ray source, ” Appl. Phys. Lett. 69, 182-184 (1996).
4. N. M. Ceglio, A. M. Hawryluk, and G. E. Sommargren, “Frontend design issues in soft-x-ray projection lithography, ” Appl. Opt. 32, 7050-7056 (1993).
5. W. Neff, D. Rothweiler, K. Eidmann, R. Lebert, F. Richter, and G. Winhart, “Laser and pinch plasma x-ray sources for microscopy and lithography, ” in Applications of Laser Plasma Radiation, M. C. Richardson, ed., Proc. SPIE 2015, 32-44 (1993).
6. F. Bijkerk, L. Shmaenok, A. van Honk, R. Bastiaensen, Y. Y. Platonov, and A. P. Shevelko, “Laser plasma sources for soft x-ray projection lithography, ” J. Phys. III (France) 4, 1669-1677 (1994).
7. F. Jin and M. Richardson, “New laser plasma source for extreme-ultraviolet lithography, ” Appl. Opt. 34, 5750-5760 (1995).
8. R. Lebert, D. Rothweiler, A. Engel, K. Bergmann, and W. Neff, “Pinch plasmas as intense EUV sources for laboratory applications, ” Opt. Quantum Electron. 28, 241-259 (1996).
9. A. V. Vinogradov and V. N. Shlyaptsev, “Characteristics of a laser plasma x-ray source (review), ” Sov. J. Quantum Electron. 17, 1-13 (1987).
10. M. Cardona, Photoemission in Solids I + II (Springer-Verlag, Berlin, 1979).
11. W. Engel, M. E. Kordesch, H. H. Rotermund, S. Kubala, and A. von Oertzen, “A UHV-compatible photoelectron emission microscope for applications in surface science, ” Ultramicroscopy 36, 148-153 (1991).
12. Yagmaster YM 1200, Lumonics, Kanata, Ontario, K2K 1Y3.
13. C. L. M. Ireland, “Gas breakdown by single, 40 ps - 50 ns, 1.06 μm laser pulses, ” J. Phys. D 7, L179-L183 (1974).
14. W. Schwanda, K. Eidmann, and M. C. Richardson, “Characterization of a flat-field grazing-incidence XUV spectrometer, ” J. X-Ray Sci. Technol. 4, 8-17 (1993).
15. G. Schriever, R. Lebert, A. Naweed, S. Mager, W. Neff, S. Kraft, F. Scholze, and G. Ulm, “Calibration of CCDs and of a pinhole transmission grating to be used as elements of a soft x-ray spectrograph, ” Rev. Sci. Instrum. 68, 3301-3306 (1997).
16. R. Hilkenbach, J. Thieme, P. Guttmann, and B. Niemann, “Phase zone plates for the Göttingen x-ray microscopes, ” in X-Ray Microscopy II, D. Sayre, M. Howells, J. Kirz, and H. Rarback, eds. (Springer-Verlag, Berlin, 1988), pp. 95-101.
17. A. G. Michette, Optical Systems for Soft XRays (Plenum, New York, 1986).
18. G. Schriever, K. Bergmann, and R. Lebert, “Narrowband laser produced EUV sources adapted to Si/Mo multilayer optics, ” J. Appl. Phys. (to be published).
19. H. Puell, “Heating of laser produced plasmas generated at plane solid targets, ” Z. Naturforsch. A 25, 1807-1815 (1970).
20. R. W. Holz, “Konzeption, realisierung und Optimierung einer plasmaröntgenquelle fur ein labormikroskop, ” Ph.D. dissertation (Rheinisch Westfalische Technische Hochschule, Aachen, Germany, 1992).
21. J. H. Underwood and T. W. Barbee, Jr., “Layered synthetic microstructures as Bragg diffractors for x-rays and extreme ultraviolet: theory and predicted performance, ” Appl. Opt. 20, 3027-3034 (1981).