Design approach and comparison of projection cameras for EUV lithography

Optical Engineering

Volumn 39, Issue 3, 2000, Pages 792-802

  Lerner, Scott A ^a,b,c   Sasian, Jose M ^a   Descour, Michael R ^a,d,e  

^a UNIVERSITY OF ARIZONA   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c RAYTHEON COMPANY   (United States)

^d UNIVERSITY OF COLORADO   (United States)

^e SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; ASPHERICS; CAMERAS; COMPUTER SIMULATION; OPTICAL COATINGS; OPTICAL MULTILAYERS; OPTIMIZATION; PHOTOLITHOGRAPHY; PROJECTION SYSTEMS;

EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYER COATINGS; PROJECTION CAMERAS;

OPTICAL DESIGN;

EID: 0033750160     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.602429     Document Type: Article

References (15)

1. T. Jewell, J. Rodgers, and K. Thompson, "Reflective systems design study for soft x-ray projection lithography," J. Vac. Sci. Technol. B 8(6), 1519-1523 (1990).
2. T. E. Jewell and K. Thompson, "Ringfield lithography," U.S. Patent No. 5,315,629 (1994).
3. J. H. Bruning, A. R. Phillips, D. R. Shafer, and A. D. White, "Lens system for x-ray projection lithography camera," U.S. Patent No. 5,353,322 (1994).
4. W. C. Sweatt, "Ring-field EUVL camera with large etendu," in Extreme Ultraviolet Lithography, OSA Technical Digest, pp. 140-143 Optical Society of America, Washington, DC (1996).
5. D. M. Williamson, "Evolution of ring field systems in microlithography," in International Optical Design Conference, L. R. Gardner and K. P. Thompson, Eds., Proc. SPIE 3482, 369-376 (1998).
6. D. W. Sweeney, R. M. Hudyma, H. N. Chapman, and D. Shafer, "EUV optical design for a 100nm CD imaging system," in Emerging Lithographic Technologies II, Proc. SPIE 3331, 2-10 (1998).
7. A. Offner, "New concepts in projection mask aligners," Opt. Eng. 14(2), 130-132 (1975).
8. R. V. Shack, "Analytical system design with pencil and ruler - the advantages of the y-ȳ diagram," in Applications of Geometrical Optics, W. J. Smith, Ed., Proc. SPIE 39, 127-140 (1973).
9. A product of Optical Research Associates, 3280 East Foothill Boulevard, Pasadena, CA 91107.
10. J. M. Sasian, "New developments in the design of ring-field projection cameras for EUV lithography: passive pupil correction," in International Optical Design Conf., L. R. Gardner and K. P. Thompson, Eds., Proc. SPIE 3482, 658-662 (1998).
11. T. E. Jewell, "Effect of amplitude and phase dispersion on images in multilayer-coated soft-x-ray projection systems," in OSA Proc. Soft-X-Ray Projection Lithography, J. Bokor, Ed., Vol. 12, pp. 113-118 (1991).
12. D. G. Sterns, R. S. Rosen, and S. P. Vernon, "Multilayer mirror technology for soft-x-ray projection lithography," Appl. Opt. 32, 6952-6960 (1993).
13. H. Yamanashi and M. Ito, "Image simulation of extreme ultraviolet lithography optics: effect of multilayer coatings," Jpn. J. Appl. Phys. 35, 6475-6479 (1996).
14. N. J. Duddles, "Effects of Mo/Si multilayer coatings on the imaging characteristics of an extreme-ultraviolet lithography system," Appl. Opt. 37, 3533-3538 (1998).
15. Center for X-Ray Optics (CXRO), Lawrence Berkeley National Laboratory, http://www-cxro.lbl.gov/multilayer/survey.html.