Fabrication of a metallic single electron tunneling transistor by multilayer technique using lithography with a scanning transmission electron microscope

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 165-168

  Weimann, Th ^a   Hinze, P ^a   Scherer, H ^a   Niemeyer, J ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON TUNNELING; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

SINGLE ELECTRON TRANSISTORS (SET);

TRANSISTORS;

EID: 0033130812     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00054-4     Document Type: Article

References (4)

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3. 3. C. Schönenberger, H. van Houten, H. C. Donkersloot, A. M. T. van der Putten, and L.G.J. Fokkink, Physica Scripta T45 (1992) 289-291.
4. 4. S. Thoms, D. S. Macintyre, and M. McCarthy, Microelectronic Engineering 41/42 (1998) 207-210.