TiN films prepared by unbalanced planar magnetron sputtering under control of photoemission of Ti

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 182-185

  Tominaga, Kikuo ^a   Inoue, Shozo ^b   Howson, Ronald P ^c   Kusaka, Kazuya ^a   Hanabusa, Takao ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

^c LOUGHBOROUGH UNIVERSITY   (United Kingdom)

Author keywords

Internal stress; PEM method; Plasma emission monitoring; TiN; Unbalanced planar magnetron

Indexed keywords

COLOR; ELECTRIC CONDUCTIVITY; FLOW OF FLUIDS; ION BOMBARDMENT; MAGNETRON SPUTTERING; NITROGEN; PHOTOEMISSION; RESIDUAL STRESSES; TITANIUM; TITANIUM NITRIDE; X RAY DIFFRACTION;

PLASMA EMISSION MONITORING; UNBALANCE PLANAR MAGNETRON SPUTTERING;

FILM PREPARATION;

EID: 0030217784     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08608-7     Document Type: Article

References (11)

1. R.P. Howson and H.A. Ja'fer, J. Vac. Sci. Technol., A10 (1992) 1784.
2. B. Window and N. Savvides, J. Vac. Sci. Technol., A4 (1986) 453.
3. R.P. Howson, A.G. Spencer, K. Oka and R.W. Lewin, J. Vac. Sci. Technol., A7 (1989) 1230.
4. S. Schiller, U. Heisig, C. Korndörfer, G. Beister, J. Reschke, K. Steinfelder and J. Strümpfel, Surf. Coat. Technol., 33 (1987) 405.
5. S. Berg, T. Larsson and H.-O. Blom, J. Vac. Sci. Technol., A4 (1986) 594.
6. M.F. Doemer and W.D. Nix, CRC Crit. Rev. Solid State and Mater. Sci., 14 (1988) 225.
7. I. Petrov, A. Myers, J.E. Greene and J.R. Abelson, J. Vac. Sci. Technol., A12 (1994) 2846.
8. A.J. Perry, J. Vac. Sci. Technol., A6 (1988) 2140.
9. B. Karlsson, R.P. Shimshock, B.O. Seraphin and J.C. Haygarth, Sol. Energy Mater., 7 (1983) 401.
10. S. Inoue, K. Tominaga, R.P. Howson and K. Kusaka, J. Vac. Sci. Technol., in press.
11. T. Hanabusa, K. Kusaka, K. Tominaga and H. Fujiwara, Proc. Int. Symp. on Nondestructive Testing and Stress-Strain measurement, Tokyo, 1992, (NDT and SSM, FENDT92), Tokyo, 1992, p. 516.