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Journal of Materials Research

Volumn 16, Issue 8, 2001, Pages 2192-2195

Highly (111)-oriented and conformal iridium films by liquid source metalorganic chemical vapor deposition

(5) Goswami, Jaydeb a Wang, Chang Gong a Majhi, Prashant a Shin, Yong Wook a Dey, Sandwip K a

a Arizona State University (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTAL MICROSTRUCTURE; DEPOSITION; IRIDIUM; METALLORGANIC CHEMICAL VAPOR DEPOSITION; POLYCRYSTALLINE MATERIALS; PYROLYSIS; SILICA; SUBSTRATES; THERMAL EFFECTS; THIN FILMS; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

IRIDIUM FILMS;

METALLIC FILMS;

EID: 0035436240 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/JMR.2001.0300 Document Type: Article

Times cited : (31)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.