SCOPUS 정보 검색 플랫폼

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 412-417

Interface properties of TiO2 on Si formed by simultaneous implantation and deposition of titanium and oxygen ions

(6) Attenberger, W a Thorwarth, G a Manova, D a Mandl S a,c Stritzker, B a Rauschenbach, B a,b

a UNIVERSITY OF AUGSBURG (Germany)

b UNIVERSITY OF LEIPZIG (Germany)

c Institute für Oberchenmodifizierung Leipzig (Germany)

Author keywords

Arc evaporation; EFTEM; Plasma immersion ion implantation; Titanium oxide; XTEM

Indexed keywords

ADHESION; DEPOSITION; ELECTRIC POTENTIAL; INTERFACES (MATERIALS); ION IMPLANTATION; SEMICONDUCTING SILICON; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

ENERGETIC IONS;

TITANIUM COMPOUNDS;

TITANIUM;

EID: 0035387561 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(01)01080-5 Document Type: Article

Times cited : (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.