SCOPUS 정보 검색 플랫폼

Volumn 8, Issue 2, 2001, Pages 143-150

Preparation and lithographic performance of novel copolymers having acid labile pendant alicyclic ether moieties

a NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

Author keywords

Acid catalyzed dehydration; Acid labile groups; Alicyclic ether; Chemical amplified reaction; Photoacid generator; Photoresist

Indexed keywords

CARBOXYLIC ACIDS; CROSSLINKING; DEHYDRATION; HEAT RESISTANCE; LITHOGRAPHY; PHOTORESISTS; PLASMA ETCHING; POLYETHERS; POLYMETHYL METHACRYLATES; SYNTHESIS (CHEMICAL); THERMOGRAVIMETRIC ANALYSIS;

ALICYCLIC BORNYL GROUP; ALICYCLIC ETHER; BORNYL METHACRYLATE; CHEMICAL AMPLIFIED REACTION; METHACRYLIC ACID; METHACRYLIC COPOLYMER; N-BUTYL METHACRYLATE; PHOTOACID GENERATOR;

COPOLYMERS;

EID: 0035355767 PISSN: 10229760 EISSN: None Source Type: Journal
DOI: 10.1007/s10965-006-0144-6 Document Type: Article

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.