Process optimization of DUV photoresists for electron beam lithography

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 287-290

  Thoms, S ^a   Macintyre, D ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; OPTIMIZATION;

IN-AIR DELAY EFFECTS;

PHOTORESISTS;

EID: 0033132120     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00083-0     Document Type: Article

References (4)

1. [1] J.W. Thackeray, Microelectronic Engineering 41/42, (1998), 37-40
2. [2] D. Macintyre and S. Thoms, Microelectronic Engineering 35, (1997), 213-216
3. [3] D.C .Montgomery, "Design and Analysis of Experiments", 3rd Edition, John Wiley &Sons, New York, (1991),
4. [4] T.P. Ryan, "Statistical Methods for Quality Improvement", John Wiley &Sons, New York,(1989)