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Volumn 178, Issue 1-4, 2001, Pages 25-32
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Point defect diffusion and clustering in ion implanted c-Si
a
CNR IMETEM
(Italy)
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Author keywords
Defects; Diffusivity; Interstitial clusters; Migration; Photoluminescence; Silicon
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Indexed keywords
AGGLOMERATION;
ANNEALING;
COMPUTER SIMULATION;
CRYSTAL GROWTH;
CRYSTALLINE MATERIALS;
ION IMPLANTATION;
KINETIC THEORY;
LEAKAGE CURRENTS;
MATHEMATICAL MODELS;
MONTE CARLO METHODS;
PHASE TRANSITIONS;
PHOTOLUMINESCENCE;
POINT DEFECTS;
INTERSTITIAL CLUSTERS;
POINT DEFECT DIFFUSION;
SILICON;
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EID: 0035333115
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(00)00504-8 Document Type: Conference Paper |
Times cited : (6)
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References (16)
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