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Volumn 178, Issue 1-4, 2001, Pages 25-32

Point defect diffusion and clustering in ion implanted c-Si

Author keywords

Defects; Diffusivity; Interstitial clusters; Migration; Photoluminescence; Silicon

Indexed keywords

AGGLOMERATION; ANNEALING; COMPUTER SIMULATION; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; ION IMPLANTATION; KINETIC THEORY; LEAKAGE CURRENTS; MATHEMATICAL MODELS; MONTE CARLO METHODS; PHASE TRANSITIONS; PHOTOLUMINESCENCE; POINT DEFECTS;

EID: 0035333115     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00504-8     Document Type: Conference Paper
Times cited : (6)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.