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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 2, 2001, Pages 557-562

Characterization of (Ti, Al)N films deposited by off-plane double bend filtered cathodic vacuum arc

(5) Cheng, Y H a Tay, B K a Lau, S P a Shi, X a Chua, H C b

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b Image Transforms Pte Ltd (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM NITRIDE; ATOMIC FORCE MICROSCOPY; CHEMICAL BONDS; COMPOSITION EFFECTS; DEPOSITION; MORPHOLOGY; NITROGEN; PHASE TRANSITIONS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; THERMOANALYSIS; TITANIUM NITRIDE; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

OFF-PLANE DOUBLE BEND FILTERED CATHODIC VACUUM ARC TECHNIQUE;

METALLIC FILMS;

EID: 0035273514 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1351063 Document Type: Article

Times cited : (3)

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