Oxidation and chemical state analysis of polycrystalline magnetron sputtered (Ti, Al)N films at ambient and liquid N2 temperatures

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 II, 2000, Pages 1571-1578

  Seal, S ^b   Kale, A ^a,b   Sundaram, K B ^b   Jimenez, D ^b  

^a UNIVERSITY OF FLORIDA   (United States)

^b UNIVERSITY OF CENTRAL FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNETRON SPUTTERING; MORPHOLOGY; NITRIDES; OXIDATION; POLYCRYSTALLINE MATERIALS; SPUTTER DEPOSITION; STOICHIOMETRY; SUBSTRATES; SURFACE CHEMISTRY; THERMAL EFFECTS; THIN FILMS; TITANIUM COMPOUNDS;

HARD COATINGS; TITANIUM ALUMINUM NITRIDE;

METALLIC FILMS;

EID: 0003038699     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582387     Document Type: Article

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