Basic constraints for a multibeam lithography column

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 2, 2001, Pages 467-475

  Mankos, M ^a   Coyle, S ^a   Fernandez, A ^a   Sagle, A ^a   Owens, W ^a   Sullivan, J ^a   Chang, T H P ^a  

^a Etec Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON OPTICS; LIGHT MODULATION; OPTICAL DESIGN; PARTICLE BEAM DYNAMICS; PHOTOCATHODES; PHOTOEMISSION;

BEAM ENERGIES; ELECTRON ELECTRON INTERACTIONS; MULTIBEAM ELECTRON COLUMN; MULTIBEAM LITHOGRAPHY; MULTIBEAM TEST BED;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035272789     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1352728     Document Type: Article

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