Multisource optimization of a column for electron lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3010-3016

  Mankos, M ^a   Coyle, S ^a   Fernandez, A ^a   Sagle, A ^a   Allen, P ^a   Owens, W ^a   Sullivan, J ^a   Chang, T H P ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LEVELS; ELECTRON LENSES; ELECTRON OPTICS; GOLD; LASER BEAMS; OPTIMIZATION; PHOTOCATHODES; PHOTOEMISSION; SEMICONDUCTING GALLIUM ARSENIDE;

NEGATIVE ELECTRON AFFINITY (NEA);

ELECTRON BEAM LITHOGRAPHY;

EID: 0034314801     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1321752     Document Type: Article

References (16)

1. H. C. Pfeiffer et al., J. Vac. Sci. Technol. B 11, 2332 (1993).
2. Y. Nakayama, S. Okazaki, N. Saitou, and H. Wakabayashi, J. Vac. Sci. Technol. B 8, 1836 (1990).
3. T. H. P. Chang et al., J. Vac. Sci. Technol. B 14, 3774 (1996).
4. A. W. Baum et al., J. Vac. Sci. Technol. B 15, 2707 (1997).
5. J. E. Schneider et al., J. Vac. Sci. Technol. B 14, 3782 (1996).
6. T. Newman, W. J. Devore, and R. F. W. Pease, J. Vac. Sci. Technol. B 1, 999 (1983).
7. S. Asai et al., Jpn. J. Appl. Phys., Part 1 32, 6012 (1995).
8. G. I. Winograd et al., J. Vac. Sci. Technol. B 15, 2289 (1997).
9. X. Jiang, C. N. Berglund, and A. E. Bell, J. Vac. Sci. Technol. B 16, 3374 (1998).
10. L. Han, M. A. McCord, G. I. Winograd, and R. F. W. Pease, J. Vac. Sci. Technol. B 16, 3215 (1998).
11. G. F. Rempfer, W. P. Skoczylas, and O. H. Griffith, Ultramicroscopy 36, 196 (1991).
12. M. Mankos et al., J. Vac. Sci. Technol. B (submitted).
13. E. A. Taft and J. Apker, J. Opt. Soc. Am. 43, 81 (1953).
14. S. H. Kong, J. Kinross-Wright, D. C. Nguyen, and R. L. Sheffield, J. Appl. Phys. 77, 6031 (1995).
15. P. Sen et al., J. Vac. Sci. Technol. B 16, 3380 (1998).
16. J. E. Schneider et al., J. Vac. Sci. Technol. B 16, 3192 (1998).