Gas phase ultraviolet spectroscopy of high-temperature superconductor precursors for chemical vapor deposition processing

Applied Physics Letters

Volumn 68, Issue 19, 1996, Pages 2726-2728

  Rappoli, Brian J ^a   DeSisto, William J ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CHEMICAL EQUIPMENT; CONTROL SYSTEMS; COPPER COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; SUPERCONDUCTING FILMS; SYSTEM STABILITY; THERMAL EFFECTS; ULTRAVIOLET SPECTROSCOPY; YTTRIUM COMPOUNDS;

BEER LAMBERT RELATION; BUBBLER; CLAUSIUS CLAPEYRON RELATION; GAS PHASE CONCENTRATION; TETRAMETHYL HEPTANEDIONATE COMPLEXES; YTTRIUM BARIUM COPPER OXIDE;

HIGH TEMPERATURE SUPERCONDUCTORS;

EID: 0030572102     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.115578     Document Type: Article

References (27)

1. J. G. Bednorz and K. A. Muller, Z. Phys. B 64, 189 (1986).
2. M. Leskelä, H. Mölsä, and L. Niinistö, Supercond. Sci. Technol. INS 6, 627 (1993).
3. J. Zhao, Y. Q. Li, C. S. Chern, P. Lu, P. Norris, B. Gallois, B. Kear, F. Cosandey, X. D. Wu, R. E. Muenchausen, and S. M. Garrison, Appl. Phys. Lett. AIP 59, 1254 (1991).
4. H. Busch, A. Fink, and A. Muller, J. Appl. Phys. AIP 70, 2449 (1991).
5. R. Hiskes, S. A. DiCarolis, J. L. Young, S. S. Laderman, R. D. Jacowitz, and R. C. Taber, Appl. Phys. Lett. AIP 59, 606 (1991).
6. R. Sato, K. Takahashi, M. Yoshino, H. Kato, and S. Ohshima, Jpn. J. Appl. Phys. INS 32, 1590 (1993).
7. S. H. Kim, C. H. Cho, K. S. No, and J. S. Chun, J. Mater. Res. AIP 6, 704 (1991).
8. S. Matsuno, F. Uchikawa, and K. Yoshizaki, Jpn. J. Appl. Phys. INS 29, 947 (1990).
9. D. L. Schulz, B. J. Hinds, D. A. Neumayer, C. L. Stern, and T. J. Marks, Chem. Mater. 5, 1605 (1993).
10. B. J. Hinds, D. L. Schulz, D. A. Neumayer, B. Han, T. J. Marks, Y. Y. Wang, V. P. Dravid, J. L. Schindler, T. P. Hogan, and C. R. Kannewurf, Appl. Phys. Lett. AIP 65, 231 (1994).
11. J. Zhang, R. A. Gardiner, P. S. Kirlin, R. W. Boerstler, and J. Steinbeck, Appl. Phys. Lett. AIP 61, 2884 (1992).
12. J. P. Stagg, Chemtronics 3, 44 (1988).
13. B. R. Butler and J. P. Stagg, J. Cryst. Growth INS 94, 481 (1989).
14. J. P. Stagg, J. Christer, E. J. Thrush, and J. Crawley, J. Cryst. Growth INS 120, 98 (1992).
15. E. Smith (private communication).
16. G. A. Hebner, K. P. Kileen, and R. M. Biefeld, J. Cryst. Growth INS 98, 293 (1989).
17. 2O). Vide infra.
18. R. H. Holm and F. A. Cotton, J. Am. Chem. Soc. INS 80, 5658 (1958).
19. J. P. Fackler, F. A. Cotton, and D. W. Barnum, Inorg. Chem. INS 2, 97 (1963).
20. H. Harima, H. Ohnishi, K. Hanaoka, K. Tachibana, and Y. Goto, Jpn. J. Appl. Phys. INS 30, 1946 (1991).
21. S. Yuhya, K. Kikuchi, M. Yoshida, K. Sugawara, and Y. Shiohara, Mol. Cryst. Liq. Cryst. INS 184, 231 (1990).
22. H. Busch, A. Fink, A. Müller, and K. Samwer, Supercond. Sci. Technol. INS 6, 42 (1992).
23. K. Chou and G. Tsai, Thermochimica. Acta 240, 129 (1994).
24. A. Gleizes, S. Sans-Lenain, D. Medus, N. Hovnanian, P. Miele, and J. D. Foulon, Inorg. Chim. Acta 209, 47 (1993).
25. W. Rees (private communication).
26. E. Waffenschmidt, J. Musolf, M. Heuken, and K. Heime, J. Supercond. 5, 119 (1992).
27. R. Amano, A. Sato, and S. Suzuki, Bull. Chem. Soc. Jpn. INS 54, 1368 (1981).