Epitaxial growth of high quality β-FeSi2 layers on Si(1 1 1) under the presence of an Sb flux

Applied Surface Science

Volumn 169-170, Issue , 2001, Pages 310-314

  Koga, Tsutomu ^a   Tatsuoka, Hirokazu ^a   Kuwabara, Hiroshi ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; DEPOSITION; INTERDIFFUSION (SOLIDS); IRON; SEMICONDUCTING SILICON; SILICON COMPOUNDS; SUBSTRATES;

IRON SILICIDES;

EPITAXIAL GROWTH;

EID: 0035127453     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00682-6     Document Type: Article

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