Growth of β-FeSi2 and FeSi layers by reactive deposition using Sb-related intermetallic compounds

Thin Solid Films

Volumn 369, Issue 1, 2000, Pages 248-252

  Koga, Tsutomu ^a   Bright, Alexander ^a   Suzuki, Tomotaka ^a   Shimada, Ken ^a   Tatsuoka, Hirokazu ^a   Kuwabara, Hiroshi ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; EPITAXIAL GROWTH; FILM GROWTH; INTERDIFFUSION (SOLIDS); SEMICONDUCTING INTERMETALLICS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SUBSTRATES; SURFACE ACTIVE AGENTS;

IRON SILICIDE; REACTIVE DEPOSITION EPITAXY (RDE);

SEMICONDUCTING FILMS;

EID: 0034225330     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00817-8     Document Type: Article

References (23)

1. H. Lange, in: R.T. Tung, K. Maex, P.W. Pellegrini, L.H. Allen (Eds.), Silicide Thin Films - Fabrication, Properties, and Applications, MRS Symp. Proc. 402 (1995) 307.
2. Lange H. Phys. Status Solidi (b). 201:1997;3.
3. Makita Y. McConnel. The 1st NREL Conference: Future Generation Photovoltaic Technologies. 1997;AIP, New-York. p. 3.
4. Derrien J., Chevrier J., Vinh L.T., et al. Appl. Surf. Sci. 73:1993;90.
5. Rizzi A., Rösen B.N.E., Freundt D. Ch. Dieker, H. Lüth, Phys. Rev. B. 51:1995;17780.
6. Derrien J., Berbezier I., Ronda A., Natoli J.Y. Appl. Surf. Sci. 92:1996;311.
7. Maeda Y., Fujita T., Akita T., Umezawa K., Miyake K. MRS Symp. Proc. 486:1998;329.
8. Katsumata H., Makita Y., Kobayashi N., Shibata H., Hasegawa M., Uekusa S. Jpn. J. Appl. Phys. 36:1997;2802.
9. Olk C.H., Karpenko O.P., Yalisove S.M., Doll G.L., Mansfield J.F. J. Mater. Res. 9:1994;2733.
10. André J.P., Alaoui H., Deswarte A., Zheng Y., Pétroff J.F., Wallart X., Nys J.P. J. Cryst. Growth. 144:1994;29.
11. Tanaka M., Kumagai Y., Suemasu T., Hasegawa F. Jpn. J. Appl. Phys. 36:1997;3620.
12. Suemasu T., Fijii T., Tanaka M., Takakura K., Iikura Y., Hasegawa F. J. Lumines. 80:1999;473.
13. Wang L., Lin C., Shen Q., Lin X., Ni R., Zou S. Appl. Phys. Lett. 66:1995;3453.
14. Kubaschewski O. Iron-Binary Phase Diagrams. 1982;Springer, Berlin. p. 136.
15. Walser R.M., Bené R.W. Appl. Phys. Lett. 28:1976;624.
16. Matsuda K., Tatsuoka H., Matsunaga K., et al. Jpn. J. Appl. Phys. 37:1998;6556.
17. Metzger R.A., Allen F.G. Surf. Sci. 137:1984;397.
18. Yan Y., Al-Jassim M.M., Matsuda K., Tatsuoka H., Kuwabara H., Pennycook S.J. Appl. Phys. Lett. 2000;. in press.
19. Fujita K., Fukatsu S., Yaguchi H., Igarashi T., Shiraki Y., Ito R. Jpn. J. Appl. Phys. 29:1990;L1981.
20. Larsson M.I., Ni W.-X., Joelsson K., Hansson G.V. Appl. Phys. Lett. 65:1994;1409.
21. Pettersson P.O., Ahn C.C., McGill T.C., Croke E.T., Hunter A.T. Appl. Phys. Lett. 67:1995;2530.
22. Jiang Z., Xu A., Hu D., et al. Thin Solid Films. 321:1998;116.
23. Hansen M. Constitution of Binary Alloys. 1958;1586 McGraw-Hill, New York.